Project title: Plasma Immersion Ion Implantation
Plasma immersion ion implantation ( PIII) is a breakthrough in ion beam technology and emulates the conventional beamline ion implantation in many aspects. The burgeoning technology has spurred research activities on surface modification, hardening, wear resistance, and other surface phenomena. Many R&D projects can evolve from this technique and examples include:
i) Fabrication of advanced electronic materials.
Specific research programs may include one or several PIII applications and the concomitant hardware and software development.
Supervisor: Prof Paul K Chu (email@example.com )
Suitable for: M.Phil./Ph.D.